Extreme ultraviolet source with wide angle vapor containment and reflux
US7479646B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 11, 2006 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Jul 19, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0035
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet source with wide-angle vapor containment and reflux is described. In the optical output directions radiating from the source plasma there is an array of tapered buffer gas heat pipes, with wick structures in the walls. In directions toward the insulators separating the discharge electrodes there are disc-shaped buffered gas heat pipes that prevent metal vapor from condensing on these insulators. A preferred electrode configuration has three electrode discs that operate in the star pinch mode. Another electrode configuration comprises two electrode discs and supports a pseudospark discharge. The star pinch variant of this source has efficiently generated 13.5 nm radiation with lithium vapor and helium buffer gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.