Method for manufacturing array substrate of translucent LCD
US7480015B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2006 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Aug 8, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136231
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method for manufacturing an array substrate of a translucent LCD capable of simultaneously forming source and drain metal layers as reflective electrodes while improving both the contact resistance in a transmissive region and the reflectivity properties in a reflective region. The source and drain metal layers have a triple-layered structure of Mo—Al—Mo and, the top Mo is selectively removed from the reflective region. As a result, the screen quality of products improves. In addition, about 5-6 masks are enough to manufacture an array substrate using half-tone exposure technology, in contrast to the prior art which uses 8-11 masks. As the number of masks and processes is reduced in this manner, the manufacturing cost decreases accordingly and the process is simplified.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.