Method and apparatus of model-based photomask synthesis
US7480891B2 · kind B2 · utility
173Cited by
8References
55Claims
0Family size
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Key dates
| Filing date | Aug 13, 2005 |
| Grant date | Jan 20, 2009 |
| Priority date | — |
| Expiry date | Dec 27, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus and method for improving image quality in a photolithographic process includes calculating a figure-of-demerit for a photolithographic mask function and then adjusting said photolithographic mask function to reduce the figure of demerit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.