Automated sputtering target production and sub systems thereof

US7480976B2 · kind B2 · utility

Assignee

• Tosoh SMD Etna, LLC · US

Inventors

• Wiley Zane Reed · Greenville, US
• Bobby R. Cosper · Piedmont, US
• Kenneth G. Schmidt · Piedmont, US
• Neil D. Bultz · Greenville, US
• Charles Wickersham · Columbus, US
• John P. Matera · Grove City, US

Key dates

• Filing date: Jan 18, 2006
• Grant date: Jan 27, 2009
• Expiry date: Jan 18, 2026

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T409/303864
• WIPO field: Control
• WIPO sector: Instruments

Abstract

A fixture and method is provided for gripping an article, such as a sputtering target. The fixture comprises a base, a first set of contact rollers, and a second set of contact rollers, wherein at least one of the first set and the second set are adjustably positioned relative to the other of the first set and the second set on the base. The contact rollers can be configured as v-grooved wheels that will only touch chamfered portions of an outer diameter of the sputtering target when the contact rollers are clamped against the sputtering target. At least one of the first set and the second set of contact rollers can be pivotally mounted on a slide, with the slide being adjustably positioned on the base of the fixture.