Method of forming conductive pattern, thin film transistor, and method of manufacturing the same
US7485576B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 8, 2005 |
| Grant date | Feb 3, 2009 |
| Priority date | — |
| Expiry date | Dec 8, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of forming a conductive pattern in which the conductive pattern can be easily formed at a low temperature without a photolithography process by forming the conductive pattern using a laser ablation method and an inkjet method, an organic thin film transistor manufactured using the method, and a method of manufacturing the organic thin film transistor. The method of forming a conductive pattern in a flat panel display device includes preparing a base member, forming a groove having the same shape as the conductive pattern in the base member, and forming the conductive pattern by applying a conductive material into the groove. The base member has one of a structure including a plastic substrate having the groove and a structure including a substrate and an insulating layer which is arranged on the substrate and which has the groove.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.