Plasma display device and method of preparing phosphor
US7486010B2 · kind B2 · utility
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Key dates
| Filing date | Feb 18, 2004 |
| Grant date | Feb 3, 2009 |
| Priority date | — |
| Expiry date | Jul 13, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2211/42
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
In a phosphor whose host crystal is constituted of an oxide, a method of preparing the phosphor where the oxygen deficiencies in the phosphor are not many, and a plasma display device using the same are provided. After processes of weighing, mixing and filling powders of the phosphor, a process for firing in a reducing atmosphere and a process for firing in an oxidizing atmosphere after the last reducing atmosphere process are provided. In addition, a firing temperature in the oxidizing atmosphere process is not less than 600° C. and not more than 1000° C.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.