Sputtering target and manufacturing method therefor, and optical recording medium and manufacturing method therefor
US7488526B2 · kind B2 · utility
6Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 20, 2006 |
| Grant date | Feb 10, 2009 |
| Priority date | — |
| Expiry date | Dec 2, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/266
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
To provide a sputtering target used for the formation of a recording layer of a recordable optical recording medium, wherein the sputtering target contains Bi and Fe and the packing density of the sputtering target is greater than 96%, and a recordable optical recording medium manufactured by using the sputtering target, which the recordable optical recording medium is capable of high-density recording even in the blue laser's wavelength range.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.