Ion source including magnet and magnet yoke assembly
US7488951B2 · kind B2 · utility
8Cited by
7References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 24, 2006 |
| Grant date | Feb 10, 2009 |
| Priority date | — |
| Expiry date | Apr 18, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3151
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion source is provided which is capable of generating and/or emitting an ion beam which may be used to deposit a layer on a substrate or to perform other functions. In certain example embodiments, a magnet yoke assembly used in the ion source is provided, and the magnet yoke assembly includes a lower yoke and an upper yoke. At least one magnet is disposed between the lower yoke and the upper yoke, with the at least one magnet having a substantially rectangular shape in certain example embodiments. The at least one magnet may be adhered to the lower yoke and/or the upper yoke.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.