System for measuring the surface geometry and surface evenness of flat products
US7489820B1 · kind B1 · utility
1Cited by
40References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 1999 |
| Grant date | Feb 10, 2009 |
| Priority date | — |
| Expiry date | Sep 7, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/306
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a device for producing a pattern on a surface for measuring, using a projector and a slide. The invention also relates to various advantageous embodiments of the measuring system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.