Patent · US Active

Method and apparatus for thermal development with vapor treatment

US7491003B2 · kind B2 · utility

2Cited by

10References

59Claims

0Family size

Assignee

E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

Mark A. Hackler · Waretown, US
James Jonathan Grant · Niskayuna, US
Bernard F. Hoff · Farmington, US
Carmo J. Pereira · Columbia, US
Wilford Shamlin · Newark, US
Thomas A. Simpson · Magherafelt, GB

Key dates

Filing date	Apr 24, 2006
Grant date	Feb 17, 2009
Priority date	—
Expiry date	Dec 12, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

This invention pertains to a method and apparatus for thermally developing a photosensitive element. The photosensitive element includes a composition layer capable of being partially liquefied upon heating. Heating the layer causes one or more organic compounds in the layer to form a vapor. Oxidation of the vapor forms carbon dioxide and water vapor and reduces the need to manage waste streams containing the organic compounds.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.