Plasma display panel producing method, and plasma display panel
US7491107B2 · kind B2 · utility
1Cited by
1References
17Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 23, 2004 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Jan 4, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2217/49207
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a method of manufacturing a PDP that prevents a defect from occurring in a structure of the PDP; and also suppresses retroflexion, exfoliation, and the like, of the structure. In photolithography, exposure is performed twice with a first and a second photomasks, each having a different aperture width, but the same exposure pattern. The amount of exposure is different between first exposure region (A′) through the first photomask; and second exposure region (B′) through the second photomask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.