Capacitor electrodes produced with atomic layer deposition for use in implantable medical devices
US7491246B2 · kind B2 · utility
9Cited by
4References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2006 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Jun 15, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01G9/06
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electrolytic capacitor cell for use in implantable medical devices and associated method for manufacture are provided. The capacitor cell includes an electrode substrate having a dielectric layer formed thereon by atomic layer deposition. In various embodiments, the dielectric layer includes an oxide of one or more valve metals.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.