Apparatus for trapping residual products in semiconductor device fabrication equipment
US7491291B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 3, 2006 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Aug 17, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus traps residual products before the products can be formed in or flow to a vacuum pump in semiconductor device manufacturing equipment. The apparatus is connected between a process chamber and the vacuum pump and includes first and second cooling plates alternately disposed inside a hollow cylindrical housing. The first cooling plates each have a base and a grid projecting from a surface of the base, and define a vent hole extending through a central portion of the base. Each of the second cooling plates have a base and a grid projecting from a surface of the base, and define a plurality of vent holes extending through an outer peripheral portion of the base. Gaseous products flowing from a process chamber and through the housing are transformed into powder that adheres to the cooling plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.