Dense coating formation by reactive deposition
US7491431B2 · kind B2 · utility
36Cited by
51References
24Claims
0Family size
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Key dates
| Filing date | Dec 20, 2004 |
| Grant date | Feb 17, 2009 |
| Priority date | — |
| Expiry date | Oct 13, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/50
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods for forming coated substrates can be based on depositing material from a flow onto a substrate in which the coating material is formed by a reaction within the flow. In some embodiments, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam. In additional or alternative embodiments, the flow with the product stream is directed at the substrate. The substrate may be moved relative to the flow. Coating materials can be formed with densities of 65 percent to 95 percent of the fully densified coating material with a very high level of coating uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.