Patent · US Active

Electrostatic deflection system for corpuscular radiation

US7491946B2 · kind B2 · utility

0Cited by

4References

21Claims

0Family size

Assignee

Leica Microsystems Lithography · DE

Inventors

Stefan Risse · Jena, DE
Thomas Peschel · Jena, DE
Christoph Damm · Jena, DE
Andreas Gebhardt · Apolda, DE
Mathias Rohde · Jena, DE
Christoph Schenk · Icking, DE
Thomas Elster · Jena, DE
Hans-Joachim Doering · Jena, DE
Gerhard Schubert · Jena, DE

Key dates

Filing date	Feb 3, 2006
Grant date	Feb 17, 2009
Priority date	—
Expiry date	Jan 26, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG21K1/087
WIPO fieldEngines, pumps, turbines
WIPO sectorMechanical engineering

Abstract

The invention is directed to electrostatic deflection systems for corpuscular beams which can be used particularly in microstructured and nanostructured applications in lithography installations or measuring equipment. According to the proposed object of the invention, the individual electrodes of a deflection system of this kind should permanently have and retain a very exact axially symmetric arrangement relative to one another. In the electrostatic deflection system according to the invention, rod-shaped electrodes are held in an axially symmetric arrangement in an inwardly hollow carrier through which a corpuscular beam can be directed. The carrier is formed of at least two, and at most four, carrier members which are connected to one another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.