Gate valve for plus-atmospheric pressure semiconductor process vessels
US7494107B2 · kind B2 · utility
14Cited by
262References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2005 |
| Grant date | Feb 24, 2009 |
| Priority date | — |
| Expiry date | Oct 26, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
An isolation valve is preferably applied to the semiconductor industry for sealing a process vessel and also operates effectively at plus-atmospheric pressures. A double containment gate valve assembly includes a housing and a movable head assembly within the housing. The housing includes a first access opening and a second access opening. The head assembly is configurable into a first position where an access path through the first and second access openings is clear, and a second position where the access path is blocked.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.