Measurement of etching
US7494596B2 · kind B2 · utility
4Cited by
33References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2003 |
| Grant date | Feb 24, 2009 |
| Priority date | — |
| Expiry date | Jan 19, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2/1603
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Methods and apparatus for determining the extent of etching in material by locating a detector element adjacent to a portion of the material that is to be etched. The width of the element varies. The resistance of the element is measured upon etching the portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.