Method of wafer-level packaging using low-aspect ratio through-wafer holes
US7495462B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2006 |
| Grant date | Feb 24, 2009 |
| Priority date | — |
| Expiry date | Mar 15, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/19043
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A wafer-level packaged IC is made by attaching a cap wafer to the front of an IC base wafer before cutting the IC base wafer, i.e. before singulating the plurality of dies on the IC base wafer. The cap wafer is mechanically attached and electrically connected to the IC base wafer, then the dies are singulated. Electrically conductive paths extend through the cap wafer, between wafer contact pads on the front surface of the cap and electrical contact points on the IC base wafer. Optionally, the cap wafer contains one or more dies. The IC base wafer can be fabricated according to a different technology than the cap wafer, thereby forming a hybrid wafer-level package. Optionally, additional “upper-level” cap wafers (with or without dies) can be stacked to form a “multi-story” IC. Optionally, a hermetically-sealed cavity headroom is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.