Method of compensating for defective pattern generation data in a variable shaped electron beam system
US7496885B1 · kind B1 · utility
2Cited by
4References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2008 |
| Grant date | Feb 24, 2009 |
| Priority date | — |
| Expiry date | Apr 2, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention comprises a system, software, and method for the treatment of mask data that produces defects in resultant images produced in the fabrication of a mask, following identification of the defects. The invention involves identifying each exposure shot with certain information which when combined with similar information related to the defects is used to control the exposure tool to toggle or modulate the shots related to the defects and thus, eliminate the defects.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.