Metal photoetching product and production method thereof
US7498074B2 · kind B2 · utility
3Cited by
2References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 16, 2004 |
| Grant date | Mar 3, 2009 |
| Priority date | — |
| Expiry date | Nov 16, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24273
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A metal photoetching product comprising at least one large cavity of minor axis W1S, major axis W1L and depth D1 in a surface of the product, wherein one or more cavities are included inside at least one of the at least one large cavity, and a smallest hole among the cavities has minor axis of W2S, major axis W2L, and depth D2; and the product satisfies the following dimensions, D1+D2=plate thickness D, 0.02 mm≦D≦2 mm, 0.4×D<W1S<D, and 0.2×D<W2S<0.8×D.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.