Patent · US Active

Method of fabricating a reflective electrode for a semiconductor light emitting device

US7501295B2 · kind B2 · utility

8Cited by
9References
10Claims
0Family size

Assignee

Inventor

Key dates

Filing dateMay 25, 2006
Grant dateMar 10, 2009
Priority date
Expiry dateJan 31, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/825

Abstract

A process is disclosed for forming a reflective electrode on a semiconductor light emitting device, the light emitting device having an active layer for generating light and a cladding layer in electrical contact with the active layer. The process involves depositing an intermediate layer of electrically conductive material on the cladding layer and causing at least a portion of the electrically conductive material to diffuse into the cladding layer. The process further involves depositing a reflective layer on the intermediate layer, the reflective layer being electrically conductive and in electrical contact with the intermediate layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.