Method for preparing a poled structure by using leakage and tunnel effects
US7502163B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2007 |
| Grant date | Mar 10, 2009 |
| Priority date | — |
| Expiry date | Nov 12, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/07
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for preparing a poled structure forms a ferroelectric substrate with a first polarization direction, wherein the ferroelectric substrate has a first surface and a second surface. An electrode-patterning process is then performed to form a first electrode structure on the first surface, and the first electrode structure includes a plurality of active blocks and a plurality of passive blocks, wherein at least one passive block is sandwiched between two active blocks. Subsequently, a poling process is performed including applying a predetermined voltage to the active blocks and floating the passive blocks such that a current such as a leakage current or a tunnel current is generated from the active blocks to the passive blocks to form a plurality of inverted domains with a second polarization direction in the ferroelectric substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.