Method and apparatus for thermal development with development medium remover

US7503258B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Robert A. McMillen · Downingtown, US
• Dietmar Dudek · Langen, DE
• Mark A. Hackler · Waretown, US
• Anandkumar R. Kannurpatti · Glen Mills, US
• John W. Trainor · Vestal, US

Key dates

• Filing date: Jul 28, 2005
• Grant date: Mar 17, 2009
• Expiry date: Feb 14, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/36
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

This invention relates to a method and apparatus for thermally developing a photosensitive element. The thermal development method includes heating the photosensitive element to a temperature sufficient to cause a portion of a composition layer in the element to liquefy, soften, or melt, contacting the heated photosensitive element with a development medium to absorb the liquefied portion at a contact location, and removing the development medium from the photosensitive element with a remover at a location away from the contact location.