Patent · US Active

Sputtering target and method/apparatus for cooling the target

US7504011B2 · kind B2 · utility

3Cited by

7References

18Claims

0Family size

Assignee

Guardian Industries Corp. · US

Inventors

Armin Schmidt · Zeulenroda, DE
Gerald Janicke · Bitterfeld-Wolfen, DE
Roland Weidl · Bollberg, DE
Hendryk Richert · Jena, DE
Bernd Gruenler · Zeulenroda, DE
Hans-Jurgen Tiller · Jena, DE
Uwe Kriltz · Bitterfeld-Wolfen, DE

Key dates

Filing date	Oct 24, 2005
Grant date	Mar 17, 2009
Priority date	—
Expiry date	Apr 5, 2027

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3405
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A sputtering target comprising an outer target tube, an inner support tube supporting a magnet carrier extending along substantially the entire length of the inner support tube; and a water cooling circuit including at least one passageway within the inner support tube with an inlet at one end thereof adapted to receive cooling water from an external source, at least one outlet aperture at an opposite end thereof opening to a cooling chamber radially between the inner support tube and the outer target tube; and a plurality of spiral vane segments attached to an outer surface of the inner support tube.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.