Energetic neutral particle lithographic apparatus and process
US7504619B2 · kind B2 · utility
8Cited by
21References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 19, 2003 |
| Grant date | Mar 17, 2009 |
| Priority date | — |
| Expiry date | Feb 18, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31752
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An energetic neutral particle lithographic apparatus is disclosed for replicating sub-micron and nanoscale patterns including a source producing a beam of energetic neutral particles, comprising atoms or molecules, by charge transfer scattering of energetic ions from the molecules of a gas, a mask member having open stencil windows in a supporting membrane, an energetic neutral particle protective layer on the membrane, and a reproduction member consisting of an energetic neutral particle-sensitive layer between a substrate and the mask for absorbing energetic neutral particles in a pattern created by the mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.