Manufacturing method of reflective layer of display device, reflective LCD device and transflective LCD device
US7505097B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 12, 2005 |
| Grant date | Mar 17, 2009 |
| Priority date | — |
| Expiry date | Feb 8, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2203/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflective and a transflective liquid crystal display device and a manufacturing method thereof are provided. The manufacturing method includes the following steps. First, a substrate structure of a reflective or a transflective liquid crystal display device is provided. Next, a reflection layer is formed over the substrate structure, a protection layer is formed over the reflection layer, and a photoresist layer is formed over the protection layer. Then, the photoresist layer is patterned to form a patterned photoresist layer, the protection layer is patterned to form a patterned protection layer, and the reflection layer is patterned to form a patterned reflection layer. Thereafter, the patterned photoresist layer is removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.