Ion mill process with sacrificial mask layer to fabricate pole tip for perpendicular recording
US7506428B2 · kind B2 · utility
6Cited by
13References
14Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 30, 2003 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | Dec 18, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/4906
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of fabrication of the write head of a perpendicular recording head allows for production of P3 pole tips of width less than 200 nm (200×10−9 meters). The method includes fabricating the P2 flux shaping layer, depositing the P3 layer, depositing a layer of ion-milling resistant material, depositing at least one sacrificial layer, shaping the P3 layer into P3 pole tip, removing the at least one sacrificial layer to leave the P3 pole tip, and encapsulating the P3 pole tip.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.