System for generating a local electron-cyclotron microwave low-pressure plasma at a predetermined location within a processing chamber

US7506609B2 · kind B2 · utility

Assignee

• Forschungszentrum Karlsruhe GmbH · DE

Inventors

• Sven Ulrich · Blankenloch, DE
• Michael Stüber · Karlsruhe, DE
• Harald Leiste · Weingarten, DE
• Lorenz Niederberger · Heidelberg, DE
• Konrad Sell · Aachen, DE
• Martina Lattemann · Tübingen, DE
• Roland Loos · Furtwangen, DE

Key dates

• Filing date: May 17, 2004
• Grant date: Mar 24, 2009
• Expiry date: Sep 23, 2024

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05H1/4622
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

In an arrangement for generating a local electron-cyclotron-microwave-low pressure plasma at a certain location within a gas-filled process chamber, a microwave supply means providing a microwave beam and a plasma localization unit generating a magnetic field are provided such that the magnetic field and the microwave beam intersect each other in the process chamber. The microwaves are uncoupled onto a concave reflection structure from the focal point thereof so that the microwave beam generated is essentially parallel. An arrangement for generating a magnetic field is movable along the microwave beam axis so that a cross volume between the microwave beam and the magnetic field can be moved along the beam axis whereby the conditions for electron cyclotron resonance are adjustable by displacement of the magnetic field.