Method for producing electron beam apparatus
US7507134B2 · kind B2 · utility
4Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2005 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | Jul 19, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J31/127
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a producing method for an electron beam emitting device, a position of a stray emission source constituting an unnecessary electron emitting part on a cathode substrate is detected, and an energy is locally applied to the detected position thereby eliminating the stray emission source, thereby providing an excellent electron beam apparatus without a deterioration in a constituent member or a trouble by an accidental discharge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.