Apparatuses, systems and processes for surface cleaning
US7507299B2 · kind B2 · utility
7Cited by
14References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 2, 2005 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | May 2, 2025 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF28G9/00
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Described and claimed are apparatuses and systems for surface cleaning comprising a pump and an applicator connected to the pump through which one or more cleaning agents can be applied to the surface at an operating pressure that is about 600 PSI or less and an operating flow rate that is about 1 gal/min or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.