Plasma generation electrode, plasma reactor, and exhaust gas cleaning apparatus
US7507934B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 14, 2007 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | Mar 14, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2437
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generation electrode capable of subjecting predetermined components contained in a fluid to be treated to their respective reaction treatments with plasmas having different intensities optimized on a reaction basis, by passing merely once the fluid to be treated, is provided. In the plasma generation electrode, a unit electrode is composed of a tabular ceramic material serving as a dielectric material and an electrically conductive film disposed in the inside of the ceramic material, a plurality of unit electrodes are layered at a constant spacing, the distance between the electrically conductive films disposed in the unit electrodes adjacent to each other is varied partly or the dielectric constant of the ceramic material constituting the unit electrode is varied partly, and plasmas having different intensities can be generated partly in the spaces.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.