Automatic wafer edge inspection and review system
US7508504B2 · kind B2 · utility
22Cited by
93References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 9, 2007 |
| Grant date | Mar 24, 2009 |
| Priority date | — |
| Expiry date | Aug 9, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9503
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate illumination and inspection system provides for illuminating and inspecting a substrate particularly the substrate edge. The system uses a light diffuser with a plurality of lights disposed at its exterior or interior for providing uniform diffuse illumination of a substrate. An optic and imaging system exterior of the light diffuser are used to inspect the plurality of surfaces of the substrate including specular surfaces. The optic can be rotated radially relative to a center point of the substrate edge to allow for focused inspection of all surfaces of the substrate edge.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.