Precision measurement of gas velocity and volumetric flow rate
US7509854B2 · kind B2 · utility
0Cited by
7References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 19, 2007 |
| Grant date | Mar 31, 2009 |
| Priority date | — |
| Expiry date | Apr 19, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01F1/46
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods are provided for precise measurement of volumetric flow within an emissions source. A general rotation element is rotatable by an operator relative to the emissions source about an axis. A precision rotation element is rotatable by an operator relative to the general rotation element from a first position ninety degrees about the axis to a second position. A conduit receives a probe. The conduit is rotatable with the precision rotation element about the axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.