Photoresist polymer compositions
US7510817B2 · kind B2 · utility
11Cited by
39References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2005 |
| Grant date | Mar 31, 2009 |
| Priority date | — |
| Expiry date | Dec 12, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.