Apparatus and methods relating to precision of control illumination exposure
US7511871B2 · kind B2 · utility
5Cited by
14References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2006 |
| Grant date | Mar 31, 2009 |
| Priority date | — |
| Expiry date | Sep 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2203/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Illumination exposure control systems comprising reflective pixelated spatial light modulators that reflect substantially all of the light impinging on them into at least two different light paths. At least one of the light paths acts as a propagating light path and transmits the light beam out of the lighting system. At least one other light path acts as a non-propagating light path and prevents the light beam from being transmitted out the system. The illumination exposure control systems provide high speed of exposure actuation and precision control of exposure duration and frequency or exposure sequences.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.