Method and apparatus for producing micro-texture on a slider substrate using chemical and mechanical polishing techniques
US7513820B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 16, 2006 |
| Grant date | Apr 7, 2009 |
| Priority date | — |
| Expiry date | Mar 16, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49048
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A system and method for producing micro-texture on a slider substrate using chemical & mechanical polishing techniques is described. In certain embodiments of the present invention, this is accomplished by a method comprising formulating an abrasive slurry solution of predetermined acidity (or pH value), treating a chemical mechanical polishing pad with the abrasive slurry, disposing magnetic heads on the chemical mechanical polishing pad and lapping and grinding the magnetic heads for a predetermined period of time. In certain embodiment of the present invention the lapping and grinding of the magnetic heads are accomplished using an apparatus comprising an abrasive slurry solution of predetermined acidity (pH value), a chemical mechanical polishing pad treated with the abrasive slurry solution, wherein the magnetic heads are attached to a fixture capable of disposing the heads on the chemical mechanical polishing pad.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.