High resolution interferometric optical frequency domain reflectometry (OFDR) beyond the laser coherence length
US7515276B2 · kind B2 · utility
84Cited by
5References
30Claims
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Key dates
| Filing date | Jul 18, 2007 |
| Grant date | Apr 7, 2009 |
| Priority date | — |
| Expiry date | Jul 18, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/3172
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The technology described here enables the use of an inexpensive laser to measure an interferometric response of an optical device under test (DUT) at reflection lengths significantly greater than the coherence length of the laser. This is particularly beneficial in practical interferometric applications where cost is a concern. In other words, inexpensive lasers having shorter coherence lengths may be used to achieve very high interferometric measurements at longer DUT reflection lengths. The technology also enables the use of such inexpensive lasers to measure Rayleigh scatter in commercial-grade, single-mode optical fiber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.