Patent · US Active

Nozzle plate producing method

US7516549B2 · kind B2 · utility

3Cited by
3References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJan 5, 2006
Grant dateApr 14, 2009
Priority date
Expiry dateFeb 10, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49401
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A method for producing a nozzle plate comprises a liquid-repellant coat removal step for conducting a plasma treatment to each chip from a same side as a liquid droplet ejecting surface under an atmospheric pressure, while supplying a gaseous mask material for protection of the liquid-repellant coat through nozzle holes from an opposite side of the liquid droplet ejecting surface in such a manner that the gaseous mask material is leaked out over the liquid droplet ejecting surface around the nozzle holes, to thereby remove the liquid-repellant coat exposed outside the mask material; and a bonding step for bonding each chip to the nozzle plate body at the area from which the liquid-repellant coat is removed by the liquid-repellant coat removal step.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.