Method and device for the subjective determination of aberrations of higher order
US7517087B2 · kind B2 · utility
24Cited by
6References
21Claims
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Key dates
| Filing date | Dec 28, 2007 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Dec 28, 2027 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/028
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A device for the subjective determination of aberrations of higher orders Xi in an optical system, in particular in an eye includes at least one observation channel into which defined plates can be introduced, the individual plates having optically active structures which correspond to a defined Zernike polynomial and to a defined amplitude, at least one order Xi of the Zernike polynomial being greater than two.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.