Spinning apparatus
US7517431B2 · kind B2 · utility
1Cited by
4References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 18, 2005 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Apr 12, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6708
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
In an embodiment, a spinning apparatus includes a spin table on which an object to be etched is placed, a rotation unit rotating the spin table, and a nozzle unit including a center nozzle, disposed on the central portion of the spin table, and at least one side nozzle, disposed on an edge of the spin table. Etching uniformity is improved over the conventional art because an etching chemical is distributed more evenly by the nozzle unit as the object to be etched is rotated. An embodiment may also include an exhaust to remove excess etching chemical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.