Method for manufacturing an LCD device
US7517464B2 · kind B2 · utility
9Cited by
9References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 4, 2006 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Apr 4, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/13629
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.