Method of manufacturing active matrix substrate, active matrix substrate, electro-optical device, and electronic apparatus
US7517735B2 · kind B2 · utility
1Cited by
6References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 19, 2005 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Aug 19, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136286
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing an active matrix substrate includes forming wiring lines each having a matrix pattern on a substrate such that a wiring line extending in any one of a first direction and a second direction is separated from another wiring line at an intersection; forming a laminated portion composed of an insulating layer and a semiconductor layer on a portion of the wiring line and the intersection; and forming a conductive layer electrically connecting the separated wiring line, and a pixel electrode electrically connected to the wiring line via the semiconductor layer on the laminated portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.