Method and device for adjusting wavelength distribution pattern in laser
US7518086B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2005 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Nov 30, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J3/0229
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A plurality of configurations is simultaneously formed in a material by a single laser beam having a desired distribution pattern of wavelengths. An input laser beam has an initial wavelength distribution pattern. The initial wavelength distribution pattern is adjusted or modified into a desired final wavelength distribution pattern. For example, the initial wavelength distribution pattern is a wide range of wavelengths in a single bell-curve distribution while the desired final wavelength distribution pattern has a specific number of sharp peaks each over a predetermined narrow range. The laser beam having the desired final wavelength distribution pattern is focused upon on a material. Because of the multiple peaks in the wavelength distribution, the laser beam is focused at a plurality of the focal distances. A number of structures is simultaneously formed in a material at the multiple focal points or at multiple locations/depths when the above laser beam is projected onto the material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.