Epitaxial nucleation and buffer sequence for via-compatible InAs/AlGaSb HEMTs
US7518165B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 14, 2006 |
| Grant date | Apr 14, 2009 |
| Priority date | — |
| Expiry date | Sep 14, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02549
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A metamorphic high electron mobility transistor having a plurality of high electron mobility transistor layers, a semi-insulating substrate, a ternary metamorphic buffer layer positioned between the semi-insulating substrate and the plurality of high electron mobility transistor layers, the ternary metamorphic buffer layer being Al1-xGaxSb such that x is greater than or equal to 0.2 but less than 0.3, a stabilizing layer positioned between the ternary metamorphic buffer layer and the plurality of high electron mobility transistor layers, the stabilizing layer being Al1-yGaySb such that y is greater than 0.2 but less than or equal to 0.3 and y is greater than x, and a nucleation layer interposed between the semi-insulating substrate and the ternary metamorphic buffer layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.