Patent · US Expired

Nanoprint equipment and method of making fine structure

US7520742B2 · kind B2 · utility

22Cited by
9References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 17, 2004
Grant dateApr 21, 2009
Priority date
Expiry dateJan 31, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/887
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

A pillar with a high aspect ratio is transferred by a nanoprinting method. In order to form a fine structure on a substrate, a nanoprinting apparatus heats and presses the substrate and a mold with a fine concave-convex pattern formed thereon, the mold having a mechanism for transferring and applying a mold-releasing agent. A method for transferring a fine structure using the aforementioned nanoprinting apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.