Manufacturing method of electro line for liquid crystal display device
US7521366B2 · kind B2 · utility
5Cited by
8References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 2002 |
| Grant date | Apr 21, 2009 |
| Priority date | — |
| Expiry date | Dec 10, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/6743
Abstract
A manufacturing method of an electro line for a liquid crystal display device includes depositing a barrier layer made of a conducting material on a substrate, depositing a copper layer (Cu) on the barrier layer, wet-etching the Cu layer using a first etchant, and dry-etching the barrier layer using a second etchant using the wet-etched Cu layer as an etch mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.