Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropatterned components

US7522260B1 · kind B1 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Andreas Kirchner · Wallenhorst, DE
• Hans-Juergen Mann · Oberkochen, DE
• Bernhard Kneer · Riedlingen, DE

Key dates

• Filing date: Sep 29, 2005
• Grant date: Apr 21, 2009
• Expiry date: Sep 29, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/706
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for correcting a field-constant astigmatism of a projection objective of a microlithography projection exposure apparatus, the projection objective having an arrangement composed of a plurality of optical elements that images at least a part of an object onto an off-axis image field lying outside at least one optical axis, the arrangement of the plurality of optical elements having a plane of symmetry that is defined by the at least one optical axis and a center of the image field, includes adjusting a position of at least one element of the plurality of optical elements in such a way that at least one linear and/or quadratic astigmatism is produced that compensates the field-constant astigmatism at least partially. A projection objective of a projection exposure apparatus, as well as a microlithographic method for producing micropatterned components uses the method.