X-ray system, X-ray apparatus, X-ray target, and methods for manufacturing same
US7522707B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 2006 |
| Grant date | Apr 21, 2009 |
| Priority date | — |
| Expiry date | Dec 8, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2235/085
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In some embodiments, an X-ray target includes a target cap formed of a substrate material and a focal track layer of emitting material, and at least one of the substrate material and the emitting material has a density greater than about 95.0% of theoretical density. In some embodiments, a method of manufacturing an X-ray target includes forming an intermediate target cap form of substrate material and a focal track layer of emitting material, and compacting the intermediate target cap form by application of gas pressure at elevated temperature to form a final target cap form, and at least the substrate material is dense substrate material having a final density greater than an intermediate density or the emitting material is dense emitting material having a final emitting material density greater than an intermediate emitting material density.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.