Structured self-cleaning surfaces and method of forming same
US7524531B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2005 |
| Grant date | Apr 28, 2009 |
| Priority date | — |
| Expiry date | Jul 21, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/259
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention involves growing diatoms on a surface for the purpose of forming nanoscale-sized siliceous structures on the surface. In accordance with the invention, diatom films are grown on various substrates, which are then fired to remove all organic material from the diatoms and produce a surface coated with intricate, nanoscale-sized structures. The nanoscale-sized structured surface is subsequently treated with a hydrophobic film-forming agent to form a structured self-cleaning surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.