Patent · US Active

Structured self-cleaning surfaces and method of forming same

US7524531B2 · kind B2 · utility

38Cited by
13References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 27, 2005
Grant dateApr 28, 2009
Priority date
Expiry dateJul 21, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/259
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The present invention involves growing diatoms on a surface for the purpose of forming nanoscale-sized siliceous structures on the surface. In accordance with the invention, diatom films are grown on various substrates, which are then fired to remove all organic material from the diatoms and produce a surface coated with intricate, nanoscale-sized structures. The nanoscale-sized structured surface is subsequently treated with a hydrophobic film-forming agent to form a structured self-cleaning surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.