Material for the treatment of lithographic substrates and lithographic printing plates

US7524613B2 · kind B2 · utility

Assignee

• Kodak Graphic Communications GmbH · DE

Inventors

• Harald Baumann · Tuttlingen, DE
• Bernd Strehmel · Berlin, DE
• Ulrich Fiebag · Würzburg, DE
• Friederike Von Gyldenfeldt · Osterode, DE
• Tanja Ebhardt · Osterode, DE
• Ulrike Dallmann · Herzberg, DE
• Dietmar Frank · Northeim, DE

Key dates

• Filing date: Jan 12, 2006
• Grant date: Apr 28, 2009
• Expiry date: Apr 16, 2026

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/145
• WIPO field: Textile and paper machines
• WIPO sector: Mechanical engineering

Abstract

Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).